Stress evolution in magnetron sputtered Ti-Zr-N and Ti-Ta-N films studied by in situ wafer curvature: Role of energetic particles
Φόρτωση...
Ημερομηνία
Συγγραφείς
Τίτλος Εφημερίδας
Περιοδικό ISSN
Τίτλος τόμου
Εκδότης
Elsevier
Περίληψη
Τύπος
Είδος δημοσίευσης σε συνέδριο
Είδος περιοδικού
peer reviewed
Είδος εκπαιδευτικού υλικού
Όνομα συνεδρίου
Όνομα περιοδικού
Thin Solid Films
Όνομα βιβλίου
Σειρά βιβλίου
Έκδοση βιβλίου
Συμπληρωματικός/δευτερεύων τίτλος
Περιγραφή
Stress evolution during reactive magnetron sputtering of binary TiN, ZrN and TaN thin films as well as ternary Ti-Zr-N and Ti-Ta-N solid-solutions was studied using real-time wafer curvature measurements. The energy of the incoming particles (sputtered atoms, backscattered At, ions) was tuned by changing either the metal target (M(Ti) = 47.9, M(Zr) = 91.2 and M(Ta) = 180.9 g/mol), the plasma conditions (effect of pressure, substrate bias or magnetron configuration) for a given target or by combining different metal targets during co-sputtering. Experimental results were discussed using the average energy of the incoming species, as calculated using Monte-Carlo simulations (SRIM code). In the early stage of growth, a rapid evolution to compressive stress states is noticed for all films. A reversal towards tensile stress is observed with increasing thickness at low energetic deposition conditions, revealing the presence of stress gradients. The tensile stress is ascribed to the development of a 'zone T' columnar growth with intercolumnar voids and rough surface. At higher energetic deposition conditions, the atomic peening mechanism is predominant: the stress remains largely compressive and dense films with more globular microstructure and smooth surface are obtained. (C) 2009 Elsevier B.V. All rights reserved.
Περιγραφή
Λέξεις-κλειδιά
stress, gradients, in situ, magnetron sputtering, ternary nitride, tin, zrn, tan, deposited thin-films, preferred orientation, nitride films, growth, coatings, gradients, thickness, systems
Θεματική κατηγορία
Παραπομπή
Σύνδεσμος
<Go to ISI>://000272861500038
http://ac.els-cdn.com/S0040609009013340/1-s2.0-S0040609009013340-main.pdf?_tid=712e111480b439ebdba4b13d4eaf5e72&acdnat=1339755600_13c13dae600e8a42809a573bf303473f
http://ac.els-cdn.com/S0040609009013340/1-s2.0-S0040609009013340-main.pdf?_tid=712e111480b439ebdba4b13d4eaf5e72&acdnat=1339755600_13c13dae600e8a42809a573bf303473f
Γλώσσα
en
Εκδίδον τμήμα/τομέας
Όνομα επιβλέποντος
Εξεταστική επιτροπή
Γενική Περιγραφή / Σχόλια
Ίδρυμα και Σχολή/Τμήμα του υποβάλλοντος
Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών