Indium Growth on Reconstructed Si(111), root 3 x root 3 and 4 x 1 In Surfaces

dc.contributor.authorVlachos, D.en
dc.contributor.authorKamaratos, M.en
dc.contributor.authorFoulias, S. D.en
dc.contributor.authorBondino, F.en
dc.contributor.authorMagnano, E.en
dc.contributor.authorMalvestuto, M.en
dc.date.accessioned2015-11-24T18:26:58Z
dc.date.available2015-11-24T18:26:58Z
dc.identifier.issn1932-7447-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/15980
dc.rightsDefault Licence-
dc.subjectenergy electron-diffractionen
dc.subjectatomic-structureen
dc.subjectray-diffractionen
dc.subjectspectroscopyen
dc.subjectmicroscopyen
dc.subjectinterfacesen
dc.subjectevolutionen
dc.subjectchainsen
dc.subjectstatesen
dc.subjectfilmsen
dc.titleIndium Growth on Reconstructed Si(111), root 3 x root 3 and 4 x 1 In Surfacesen
heal.abstractThe morphology and growth mechanism of nanostructurcd metals on semiconducting substrates determine crucially the electronic and physicochemical properties of these adsorption systems, In some cases. these properties are affected by modification of the interfacial geometry, induced by the metal adsorbate on the semiconducting substrate. Thus, in this work we investigate indium growth on the Si(111) root 3 x root 3 and Si(111)4 x I surfaces reconstructed by indium. The basic motivation of this study is to reveal how reconstruction of the silicon surface affects the growth mode and electronic properties of the indium overlayer. Therefore. the In/Si interface was mainly studied he Si 2p and In 4d photoemission spectra as well is he valence band measurements using synchrotron radiation, In addition, low-energy electron diffraction. Auger electron spectroscopy, thermal desorption spectroscopy, and electron energy loss spectroscopy were used to reveal the structure and adsorption states of the indium ticket-hate on the reconstructed silicon substrates. The results indicate that the initial In Si surf tee symmetry affects the growth mechanism of the indium overlayer. In particular, the Stransky-Krastanov mode holds for indium adsorption On the clean Si(111)7 x 7 and Si(111) root 3 x root 3 In-reconstructed surface. On the other hand, indium develops on the Si(111)4 x 1 In surface according to the Volmer Weber mechanism. The adsorbate approaches the metallic phase as the coverage approximates the monolayer irrespective of the substrate symmetry.en
heal.accesscampus-
heal.fullTextAvailabilityTRUE-
heal.identifier.primaryDoi 10.1021/Jp105278r-
heal.identifier.secondary<Go to ISI>://000282855400059-
heal.identifier.secondaryhttp://pubs.acs.org/doi/pdfplus/10.1021/jp105278r-
heal.journalNameJournal of Physical Chemistry Cen
heal.journalTypepeer reviewed-
heal.languageen-
heal.publicationDate2010-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Επιστημών και Τεχνολογιών. Τμήμα Βιολογικών Εφαρμογών και Τεχνολογιώνel
heal.typejournalArticle-
heal.type.elΆρθρο Περιοδικούel
heal.type.enJournal articleen

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