Optical properties, structural parameters, and bonding of highly textured rocksalt tantalum nitride films
Φόρτωση...
Ημερομηνία
Συγγραφείς
Matenoglou, G. M.
Koutsokeras, L. E.
Lekka, C. E.
Abadias, G.
Camelio, S.
Evangelakis, G. A.
Kosmidis, C.
Patsalas, P.
Τίτλος Εφημερίδας
Περιοδικό ISSN
Τίτλος τόμου
Εκδότης
American Institute of Physics
Περίληψη
Τύπος
Είδος δημοσίευσης σε συνέδριο
Είδος περιοδικού
peer reviewed
Είδος εκπαιδευτικού υλικού
Όνομα συνεδρίου
Όνομα περιοδικού
Journal of Applied Physics
Όνομα βιβλίου
Σειρά βιβλίου
Έκδοση βιβλίου
Συμπληρωματικός/δευτερεύων τίτλος
Περιγραφή
Tantalum nitride is an interesting solid with exceptional properties and it might be considered as a representative model system of the d(3)s(2) transition metal nitrides. In this work highly textured, stoichiometric, rocksalt TaN(111) films have been grown on Si(100) by pulsed laser deposition. The films were under a triaxial stress, which has been determined by the sin(2) psi method. The stress-free lattice parameter was found to be 0.433 +/- 0.001 nm, a value which has been also determined by ab initio calculations within the local spin density approximation. The optical properties of TaN have been studied using spectroscopic ellipsometry and detailed band structure calculations. The electron conductivity of TaN is due to the Ta 5dt(2g) band that intercepts the Fermi level and is the source of intraband absorption. The plasma energies of fully dense rocksalt TaN were found to be 9.45 and 9.7 eV based on the experimental results and ab initio calculations, respectively. Additional optical absorption bands were also observed around 1.9 and 7.3 eV and attributed to be due to crystal field splitting of the Ta 5d band (t(2g)-> e(g) transition) and the N p -> Ta d interband transition, respectively.
Περιγραφή
Λέξεις-κλειδιά
ab initio calculations, absorption coefficients, band structure, crystal field interactions, density functional theory, electrical conductivity, fermi level, lattice constants, pulsed laser deposition, stoichiometry, tantalum compounds, thin films, atomic layer deposition, delta-tan layers, thin-films, spectroscopic ellipsometry, preferred orientation, electronic-properties, copper metallization, diffusion-barriers, transport-properties, epitaxial-growth
Θεματική κατηγορία
Παραπομπή
Σύνδεσμος
<Go to ISI>://000262225100131
http://link.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JAPIAU000104000012124907000001
http://link.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JAPIAU000104000012124907000001
Γλώσσα
en
Εκδίδον τμήμα/τομέας
Όνομα επιβλέποντος
Εξεταστική επιτροπή
Γενική Περιγραφή / Σχόλια
Ίδρυμα και Σχολή/Τμήμα του υποβάλλοντος
Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών