Structure, electronic properties and electron energy loss spectra of transition metal nitride films
| dc.contributor.author | Koutsokeras, L. E. | en |
| dc.contributor.author | Matenoglou, G. M. | en |
| dc.contributor.author | Patsalas, P. | en |
| dc.date.accessioned | 2015-11-24T17:38:46Z | |
| dc.date.available | 2015-11-24T17:38:46Z | |
| dc.identifier.issn | 0040-6090 | - |
| dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14546 | |
| dc.rights | Default Licence | - |
| dc.subject | transition metal nitrides | en |
| dc.subject | microstructure | en |
| dc.subject | electronics properties | en |
| dc.subject | eels | en |
| dc.subject | thin-films | en |
| dc.subject | optical-properties | en |
| dc.subject | preferred orientation | en |
| dc.subject | titanium nitride | en |
| dc.subject | coatings | en |
| dc.subject | eels | en |
| dc.subject | aes | en |
| dc.subject | metallization | en |
| dc.subject | nitrogen | en |
| dc.subject | xps | en |
| dc.title | Structure, electronic properties and electron energy loss spectra of transition metal nitride films | en |
| heal.abstract | We present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features(metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratories. (c) 2012 Elsevier B.V. All rights reserved. | en |
| heal.access | campus | - |
| heal.fullTextAvailability | TRUE | - |
| heal.identifier.primary | DOI 10.1016/j.tsf.2012.06.086 | - |
| heal.identifier.secondary | <Go to ISI>://000314115800009 | - |
| heal.journalName | Thin Solid Films | en |
| heal.journalType | peer reviewed | - |
| heal.language | en | - |
| heal.publicationDate | 2013 | - |
| heal.publisher | Elsevier | en |
| heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
| heal.type | journalArticle | - |
| heal.type.el | Άρθρο Περιοδικού | el |
| heal.type.en | Journal article | en |
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