Flow Phenomena in Chemical Vapor-Deposition of Thin-Films

dc.contributor.author	Jensen, K. F.	en
dc.contributor.author	Einset, E. O.	en
dc.contributor.author	Fotiadis, D. I.	en
dc.date.accessioned	2015-11-24T17:34:26Z
dc.date.available	2015-11-24T17:34:26Z
dc.identifier.issn	0066-4189	-
dc.identifier.uri	https://olympias.lib.uoi.gr/jspui/handle/123456789/13965
dc.rights	Default Licence	-
dc.subject	mixed convection	en
dc.subject	double-diffusive phenomena	en
dc.subject	thermal and solutal convection	en
dc.subject	finite-element flow simulations	en
dc.subject	materials processing	en
dc.subject	horizontal mocvd reactors	en
dc.subject	monte-carlo simulation	en
dc.subject	growth-rate uniformity	en
dc.subject	rotating-disk	en
dc.subject	transport phenomena	en
dc.subject	mass-transfer	en
dc.subject	gas-phase	en
dc.subject	directional solidification	en
dc.subject	thermal-convection	en
dc.subject	mathematical-model	en
dc.title	Flow Phenomena in Chemical Vapor-Deposition of Thin-Films	en
heal.access	campus	-
heal.fullTextAvailability	TRUE	-
heal.identifier.primary	DOI 10.1146/annurev.fluid.23.1.197	-
heal.identifier.secondary	<Go to ISI>://A1991ET75000009	-
heal.journalName	Annual Review of Fluid Mechanics	en
heal.journalType	peer reviewed	-
heal.language	en	-
heal.publicationDate	1991	-
heal.recordProvider	Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών	el
heal.type	journalArticle	-
heal.type.el	Άρθρο Περιοδικού	el
heal.type.en	Journal article	en

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