Sodium and chlorine coadsorption on Si(100)

dc.contributor.authorKamaratos, M.en
dc.contributor.authorPapageorgopoulos, C. A.en
dc.date.accessioned2015-11-24T18:35:20Z
dc.date.available2015-11-24T18:35:20Z
dc.identifier.issn0218-625X-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/17084
dc.rightsDefault Licence-
dc.subjectadsorption geometryen
dc.subjectbonding sitesen
dc.subjectalkali-halideen
dc.subjectcl ionsen
dc.subjectsurfaceen
dc.subjectdesorptionen
dc.subjectsi(111)en
dc.subjectsien
dc.subjectnaen
dc.subjectchemisorptionen
dc.titleSodium and chlorine coadsorption on Si(100)en
heal.abstractIn this paper we study the adsorption of molecular chlorine on the Si(100)(2 x 1) surface and its interaction with sodium at room and elevated temperature in an ultrahigh vacuum. Cl is deposited dissociatively on the surface and forms SiCl2 and SiCl4. During Na deposition on the Cl-covered Si(100) surface, the substrate participates to a NaSiCl2 compound formation, whereas Cl deposition on Na-covered SI(100) leads to NaCl formation, which is grown with the (100) plane parallel to the surface. After the completion of the NaCl formation, the excess Cl interacts with the substrate and forms Si-Cl compounds. The presence of Na on the surface prevents partly the chlorination of Si, depending on the amount of Na. At elevated temperatures, the NaCl dissociates according to the equation 2NaCl + Si --> Na2Cl + SiCl and desorbs.en
heal.accesscampus-
heal.fullTextAvailabilityTRUE-
heal.identifier.secondary<Go to ISI>://000170581500004-
heal.identifier.secondaryhttp://www.worldscinet.com/srl/08/0803n04/S0218625X01001014.html-
heal.journalNameSurface Review and Lettersen
heal.journalTypepeer reviewed-
heal.languageen-
heal.publicationDate2001-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Επιστημών και Τεχνολογιών. Τμήμα Βιολογικών Εφαρμογών και Τεχνολογιώνel
heal.typejournalArticle-
heal.type.elΆρθρο Περιοδικούel
heal.type.enJournal articleen

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