Optimization of layer structure for InGaAs channel pseudomorphic HEMTs
dc.contributor.author | Pearson, J. L. | en |
dc.contributor.author | Holland, M. C. | en |
dc.contributor.author | Stanley, C. R. | en |
dc.contributor.author | Long, A. R. | en |
dc.contributor.author | Skuras, E. | en |
dc.contributor.author | Asenov, A. | en |
dc.contributor.author | Davies, J. H. | en |
dc.date.accessioned | 2015-11-24T17:37:04Z | |
dc.date.available | 2015-11-24T17:37:04Z | |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14312 | |
dc.rights | Default Licence | - |
dc.subject | pseudomorphic hemt | en |
dc.subject | molecular beam epitaxy | en |
dc.subject | transport measurements | en |
dc.subject | ingaas | en |
dc.subject | alloy scattering | en |
dc.subject | transport | en |
dc.title | Optimization of layer structure for InGaAs channel pseudomorphic HEMTs | en |
heal.abstract | Electron scattering in the pseudomorphic InGaAs channel of an InGaAs-AlGaAs heterostructure grown by molecular beam epitaxy has been studied at low temperatures to optimize the layer structure for use at 300 K in high-frequency transistors (p-HEMTs). (C) 1999 Elsevier Science B.V. All rights reserved. | en |
heal.access | campus | - |
heal.fullTextAvailability | TRUE | - |
heal.identifier.primary | Doi 10.1016/S0022-0248(98)01462-6 | - |
heal.identifier.secondary | <Go to ISI>://000080406000162 | - |
heal.journalName | Journal of Crystal Growth | en |
heal.journalType | peer reviewed | - |
heal.language | en | - |
heal.publicationDate | 1999 | - |
heal.publisher | Elsevier | en |
heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
heal.type | journalArticle | - |
heal.type.el | Άρθρο Περιοδικού | el |
heal.type.en | Journal article | en |
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